Title:
PLASMA SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2023/068692
Kind Code:
A1
Abstract:
A plasma substrate treatment apparatus according to one embodiment of the present invention comprises: a remote plasma generator for generating plasma and an active species; an upper chamber having an opening connected to an output port of the remote plasma generator and receiving and diffusing the active species of the remote plasma generator; a first baffle disposed on the opening of the upper chamber; a lower chamber receiving the diffused active species from the upper chamber; a second baffle partitioning the upper chamber and the lower chamber and transmitting the active species; a substrate holder for supporting a substrate disposed in the lower chamber; and an RF power source applying RF power to the substrate holder.
Inventors:
JEON BUIL (KR)
SHIN TAEHO (KR)
LIM DOOHO (KR)
PARK JUNGSU (KR)
ON BUMSOO (KR)
LEE SEUNGHO (KR)
SHIN TAEHO (KR)
LIM DOOHO (KR)
PARK JUNGSU (KR)
ON BUMSOO (KR)
LEE SEUNGHO (KR)
Application Number:
PCT/KR2022/015701
Publication Date:
April 27, 2023
Filing Date:
October 17, 2022
Export Citation:
Assignee:
INNOVATION FOR CREATIVE DEVICES CO LTD (KR)
International Classes:
H01J37/32
Foreign References:
| KR20120111060A | 2012-10-10 | |||
| KR20190027084A | 2019-03-14 | |||
| JP2010524225A | 2010-07-15 | |||
| US20030079983A1 | 2003-05-01 | |||
| KR100441297B1 | 2004-07-23 |
Attorney, Agent or Firm:
NURY PATENT LAW FIRM (KR)
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