Title:
PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2006/129643
Kind Code:
A1
Abstract:
In a plasma oxidation treatment apparatus (100), double plates (60) are arranged above a susceptor (2). An upper plate (61) and a lower plate (62) are composed of a dielectric material such as quartz, separately arranged in parallel at a prescribed interval, for instance an interval of 5mm, and have a plurality of through holes (61a, 62a). The two plates are arranged one over another by shifting the positions so that the through hole (62a) of the lower plate (62) and the through hole (61a) of the upper plate (61) are not overlapped.
Inventors:
YAMASHITA JUN (JP)
NAKANISHI TOSHIO (JP)
NISHITA TATSUO (JP)
NAKANISHI TOSHIO (JP)
NISHITA TATSUO (JP)
Application Number:
PCT/JP2006/310746
Publication Date:
December 07, 2006
Filing Date:
May 30, 2006
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
YAMASHITA JUN (JP)
NAKANISHI TOSHIO (JP)
NISHITA TATSUO (JP)
YAMASHITA JUN (JP)
NAKANISHI TOSHIO (JP)
NISHITA TATSUO (JP)
International Classes:
H01L21/31; H01L21/316; H01L21/318; H05H1/46
Domestic Patent References:
| WO2004047157A1 | 2004-06-03 |
Foreign References:
| JPH04225226A | 1992-08-14 | |||
| JPH0684837A | 1994-03-25 | |||
| JPH0897155A | 1996-04-12 |
Attorney, Agent or Firm:
Takayama, Hiroshi (Daiichi Shinwa Building 10-8, Akasaka 2-chom, Minato-ku Tokyo, JP)
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