PLASMA TREATMENT DEVICE AND COIL USED THEREIN

WIPO Patent Application WO/2015/151150

A1

A plasma etching device is provided with: a chamber that is configured so as to comprise a treatment space and a plasma generation space (4); a coil (20) that is wrapped around a treatment chamber (2); and the like. Six inwardly protruding sections (21) that protrude farther inward in the radial direction than a pitch circle (P) that is set on the outside of a part of the treatment chamber (2) that corresponds to the plasma generation space and five outwardly protruding sections (22) that protrude farther outward in the radial direction than the pitch circle (P) are continuously formed in the coil (20). The six inwardly protruding sections (21), the five outwardly protruding sections (22), and a gap section between power introduction sections (20a) and (20b) are arranged at equal intervals in an alternating manner along the circumferential direction of the pitch circle (P).

JP2022078684	PLASMA PROCESSING APPARATUS, MANUFACTURING METHOD THEREOF, AND PLASMA PROCESSING METHOD
WO/2002/089536	METHOD FOR PLASMA-CATALYTIC CONVERSION OF FUELS THAT CAN BE USED IN AN INTERNAL COMBUSTION ENGINE OR A GAS TURBINE INTO A SYNTHETIC GAS AND THE PLASMA-CATALYTIC CONVERTER USED FOR SAME
WO/2018/015896	AN APPARATUS FOR GENERATING ELECTROMAGNETIC WAVES

HAYAMI TOSHIHIRO (JP)
MIYAZAKI TOSHIYA (JP)

PCT/JP2014/059432

October 08, 2015

March 31, 2014

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SPP TECHNOLOGIES CO LTD (JP)

H05H1/46; H01L21/205; H01L21/3065

JP2012018921A	2012-01-26
JP2002540617A	2002-11-26

MURAKAMI, SATOSHI (JP)
Tomoji Murakami (JP)

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