Title:
PLASMA TREATMENT DEVICE AND TEMPERATURE MEASUREMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2024/048273
Kind Code:
A1
Abstract:
In the present invention, a base is arranged inside a plasma treatment chamber. An electrostatic chuck is arranged on the upper part of the base. A first heater electrode layer is arranged inside the electrostatic chuck. A second heater electrode layer is arranged inside the electrostatic chuck at a position different from that of the first heater electrode layer in a plan view. A first temperature sensor measures the temperature of the first heater electrode layer. A second temperature sensor measures the temperature of the second heater electrode layer. A signal line is electrically connected to the first temperature sensor and the second temperature sensor. A GND line is electrically connected to the first temperature sensor and the second temperature sensor. A signal detection unit is electrically connected to the signal line and the GND line.
Inventors:
YAMADA KAZUHITO (JP)
TAMONOKI SHINYA (JP)
TAMONOKI SHINYA (JP)
Application Number:
PCT/JP2023/029549
Publication Date:
March 07, 2024
Filing Date:
August 16, 2023
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/3065; G05D23/00; H01L21/205; H01L21/31; H01L21/683
Foreign References:
| JP2014527309A | 2014-10-09 | |||
| JP2009040035A | 2009-02-26 | |||
| JP2012042428A | 2012-03-01 | |||
| JP2020168829A | 2020-10-15 | |||
| JP2020118560A | 2020-08-06 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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