Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/063708
Kind Code:
A1
Abstract:
A plasma treatment device includes: a treatment vessel having a ceiling with an
opening so that vacuuming can be performed inside; a table arranged in the treatment vessel
for mounting an object to be treated; a top plate made of a dielectric body transmitting
microwaves and hermetically mounted at the opening of the ceiling; a flat antenna
member arranged on the upper surface of the top plate for introducing microwaves
into the treatment vessel; and a coaxial waveguide having a center conductor
connected to a center portion of the flat antenna member for supplying microwaves.
A gas passage is formed through the center conductor, the center portion of the
flat antenna member, and the center portion of the top plate. An electric field
attenuating concave portion for attenuating field intensity of the center portion
of the top plate is arranged on the upper surface of the center region of the top
plate.
Inventors:
TIAN CAIZHONG (JP)
NISHIZUKA TETSUYA (JP)
NOZAWA TOSHIHISA (JP)
NISHIZUKA TETSUYA (JP)
NOZAWA TOSHIHISA (JP)
Application Number:
PCT/JP2006/322750
Publication Date:
June 07, 2007
Filing Date:
November 15, 2006
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
TIAN CAIZHONG (JP)
NISHIZUKA TETSUYA (JP)
NOZAWA TOSHIHISA (JP)
TIAN CAIZHONG (JP)
NISHIZUKA TETSUYA (JP)
NOZAWA TOSHIHISA (JP)
International Classes:
C23C16/511; H01L21/205; H01L21/3065; H05H1/46
Foreign References:
| JP2005268763A | 2005-09-29 | |||
| JP2004265916A | 2004-09-24 | |||
| JP2004039972A | 2004-02-05 | |||
| JP2004266268A | 2004-09-24 |
Attorney, Agent or Firm:
YOSHITAKE, Kenji et al. (Room 323 Fuji Bldg., 2-3, Marunouchi 3-chom, Chiyoda-ku Tokyo 05, JP)
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