Title:
PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/136008
Kind Code:
A1
Abstract:
Provided is a plasma treatment device which generates plasma in a vacuum container by supply of a high frequency current to an antenna provided outside the vacuum container, said plasma treatment device comprising: a slit plate which closes an opening that is formed in the vacuum container so as to face the antenna; a dielectric plate which closes, from the outside of the vacuum container, a slit formed in the slit plate; and a mask plate which covers the slit from the inside of the vacuum container with a gap therebetween.
Inventors:
ANDO YASUNORI (JP)
Application Number:
PCT/JP2022/045563
Publication Date:
July 20, 2023
Filing Date:
December 09, 2022
Export Citation:
Assignee:
NISSIN ELECTRIC CO LTD (JP)
International Classes:
H05H1/46; C23C16/505; H01L21/3065; H01L21/31
Foreign References:
JP2021168276A | 2021-10-21 | |||
JP2021052170A | 2021-04-01 | |||
JP2021118114A | 2021-08-10 |
Attorney, Agent or Firm:
NISHIMURA, Ryuhei et al. (JP)
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