Title:
PLASMA TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2023/005055
Kind Code:
A1
Abstract:
A plasma treatment method, which is applied to a plasma treatment apparatus, wherein the plasma treatment apparatus comprises an ion source cavity (10), and sediment is present in the ion source cavity (10). The plasma treatment method comprises: introducing cleaning gas into an ion source cavity (10) for ionization to generate a first plasma, so that the first plasma reacts with sediment in the ion source cavity (10) to generate a gas compound, which is then discharged, thereby achieving the aim of cleaning the sediment in the ion source cavity (10).
Inventors:
HAN DAJIAN (CN)
LI NA (CN)
PENG TAIYAN (CN)
CHE DONGCHEN (CN)
XU KAIDONG (CN)
LI NA (CN)
PENG TAIYAN (CN)
CHE DONGCHEN (CN)
XU KAIDONG (CN)
Application Number:
PCT/CN2021/130029
Publication Date:
February 02, 2023
Filing Date:
November 11, 2021
Export Citation:
Assignee:
JIANGSU LEUVEN INSTR CO LTD (CN)
International Classes:
B08B5/00; B08B7/00; B08B9/08; H01L21/3065
Foreign References:
| CN101379583A | 2009-03-04 | |||
| CN102113094A | 2011-06-29 | |||
| CN102549705A | 2012-07-04 | |||
| CN111069192A | 2020-04-28 | |||
| CN109935513A | 2019-06-25 | |||
| CN202110873631A | 2021-07-30 |
Attorney, Agent or Firm:
UNITALEN ATTORNEYS AT LAW (CN)
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