Title:
PLC SYSTEM FOR AUTOMATICALLY CONTROLLING PID FOR MAINTAINING TARGET WATER QUALITY VALUE BY DEPOSITING WATER TREATMENT CHEMICAL
Document Type and Number:
WIPO Patent Application WO/2012/060518
Kind Code:
A1
Abstract:
A PLC system for automatically controlling PID for controlling the target value for residual chemicals in a water treatment facility, according to the present invention, comprises: a PID control software; a main control room computer for generating a PID control command regarding chemical deposit amount and relaying same to a field control PLC in a chemical room; the field control PLC in the chemical room for receiving a PID control command signal from the main control room computer and performing computing and control; and a chemical depositor in the chemical room for receiving the control signal from the field control PCL and depositing the indicated amount of chemicals, wherein the main control room computer calculates an initial setting value for the chemical deposit amount and generates the PID control command.
Inventors:
LEE TAE IL (KR)
KIM HO JIN (KR)
KIM HO JIN (KR)
Application Number:
PCT/KR2011/000501
Publication Date:
May 10, 2012
Filing Date:
January 25, 2011
Export Citation:
Assignee:
LEE TAE IL (KR)
KIM HO JIN (KR)
KIM HO JIN (KR)
International Classes:
G05B19/05; G05B11/36
Foreign References:
| KR20100012535A | 2010-02-08 | |||
| KR20010056918A | 2001-07-04 | |||
| KR100219440B1 | 1999-10-01 | |||
| KR20080107016A | 2008-12-10 | |||
| KR20080015381A | 2008-02-19 |
Attorney, Agent or Firm:
JEONG, Tae Hoon et al. (KR)
정태훈 (KR)
정태훈 (KR)
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Claims: