Title:
PLECTRANTHUS AMBOINICUS EXTRACT FOR USE IN ALLEVIATION OF RADIATION-INDUCED SKIN DISORDERS
Document Type and Number:
WIPO Patent Application WO/2024/002058
Kind Code:
A1
Abstract:
A method for alleviating radiation-induced skin disorder (e.g., radiation dermatitis), comprising administering to a subject in need thereof an effective amount of a pharmaceutical composition comprising salvigenin, and optionally cirsimaritin, rosmarinic acid, carvacrol, or a combination thereof.
Inventors:
LU KUNG-MING (CN)
CHEN SHYI-GEN (CN)
CHEN JUI-CHING (CN)
CHEN SHYI-GEN (CN)
CHEN JUI-CHING (CN)
Application Number:
PCT/CN2023/102711
Publication Date:
January 04, 2024
Filing Date:
June 27, 2023
Export Citation:
Assignee:
ONENESS BIOTECH CO LTD (CN)
International Classes:
A61K31/02; A61K9/06; A61K31/704; A61K36/18; A61K36/28; A61P17/00; A61P17/02
Domestic Patent References:
| WO2018014805A1 | 2018-01-25 | |||
| WO2008119097A1 | 2008-10-09 |
Foreign References:
| FR2812544A1 | 2002-02-08 | |||
| CN105194286A | 2015-12-30 | |||
| JPH07118151A | 1995-05-09 | |||
| US20160263013A1 | 2016-09-15 | |||
| US20090186854A1 | 2009-07-23 | |||
| CN111686020A | 2020-09-22 |
Attorney, Agent or Firm:
LIU , SHEN & ASSOCIATES (CN)
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