Title:
POLISHING AGENT COMPOSITION FOR SAPPHIRE SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2016/043089
Kind Code:
A1
Abstract:
Provided is a polishing agent composition for a sapphire substrate with which a polishing surface devoid of surface defects such as scratches can be obtained with a high polishing speed and high polishing accuracy. The present invention contains as components inorganic polishing material particles, a polishing accelerator, and water. The inorganic polishing material particles are alumina particles, and the polishing accelerator is an oxoacid salt, the pH being 9.0-13.0. The oxoacid salt is an alkali metal salt or an alkaline-earth metal salt of an oxoacid of aluminum, silicon, or boron.
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Inventors:
YAMAGUCHI YOSHINOBU (JP)
NAITO KENJI (JP)
HORIMOTO SANAKI (JP)
NAITO KENJI (JP)
HORIMOTO SANAKI (JP)
Application Number:
PCT/JP2015/075424
Publication Date:
March 24, 2016
Filing Date:
September 08, 2015
Export Citation:
Assignee:
YAMAGUCHI SEIKEN KOGYO KK (JP)
International Classes:
H01L21/304; B24B37/00; C09K3/14
Foreign References:
| JP2009516928A | 2009-04-23 |
Attorney, Agent or Firm:
NISHIJIMA Takaki et al. (JP)
Takayoshi Nishijima (JP)
Takayoshi Nishijima (JP)
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