Title:
POLISHING AGENT
Document Type and Number:
WIPO Patent Application WO/2012/043220
Kind Code:
A1
Abstract:
This polishing agent is composed of a complex metal oxide which comprises a univalent or bivalent metallic element (that is not a transition metal element) and a transitional metal element, and is used for polishing silicon carbide, corundum aluminium oxide, and gallium nitride. A complex metal oxide containing one, two, or more varieties of transition metallic elements selected from a group including an alkaline metallic element, manganum, cobalt, and nickel is preferred. The complex metal oxide being LiMn2O4, LiCoO2 or LiNiO2 is particularly favorable.
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Inventors:
YANAGI KIYOTAKA (JP)
KOIKE ATSUSHI (JP)
SUZUOKA KENJI (JP)
YASHIMA ISAMU (JP)
KOIKE ATSUSHI (JP)
SUZUOKA KENJI (JP)
YASHIMA ISAMU (JP)
Application Number:
PCT/JP2011/070891
Publication Date:
April 05, 2012
Filing Date:
September 13, 2011
Export Citation:
Assignee:
MITSUI MINING & SMELTING CO (JP)
YANAGI KIYOTAKA (JP)
KOIKE ATSUSHI (JP)
SUZUOKA KENJI (JP)
YASHIMA ISAMU (JP)
YANAGI KIYOTAKA (JP)
KOIKE ATSUSHI (JP)
SUZUOKA KENJI (JP)
YASHIMA ISAMU (JP)
International Classes:
H01L21/304; B24B37/00; C09K3/14
Foreign References:
| JP2002270548A | 2002-09-20 | |||
| JP2007154155A | 2007-06-21 | |||
| JP2008536321A | 2008-09-04 | |||
| JP2006310362A | 2006-11-09 |
Attorney, Agent or Firm:
HATORI, Osamu (JP)
Osamu Hatori (JP)
Osamu Hatori (JP)
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Claims: