Title:
POLISHING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/039265
Kind Code:
A1
Abstract:
A polishing composition for polishing a work including an oxide film and a nitride film, the composition having a pH of 2.0 or higher and containing silica that shows a positive zeta potential.
Inventors:
YOSHIDA KYOHEI (JP)
OTA YOSHIHARU (JP)
HOSOKAWA KOICHIRO (JP)
OTA YOSHIHARU (JP)
HOSOKAWA KOICHIRO (JP)
Application Number:
PCT/JP2015/075202
Publication Date:
March 17, 2016
Filing Date:
September 04, 2015
Export Citation:
Assignee:
NITTA HAAS INC (JP)
International Classes:
C09K3/14; B24B37/00; C01G1/02; H01L21/304
Foreign References:
| JP2005101545A | 2005-04-14 | |||
| JP2011216582A | 2011-10-27 | |||
| JP2008166568A | 2008-07-17 | |||
| JP2014140056A | 2014-07-31 |
Attorney, Agent or Firm:
FUJIMOTO, NOBORU (JP)
Noboru Fujimoto (JP)
Noboru Fujimoto (JP)
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