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Patent Searching and Data


Title:
POLISHING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/174008
Kind Code:
A1
Abstract:
Provided is a polishing composition which is capable of effectively improving the polishing rate. The present invention provides a polishing composition for polishing a polishing object material. This polishing composition contains water, an oxidant and a polishing accelerator, but does not contain abrasive grains. At least one metal salt selected from the group consisting of alkali metal salts and alkaline earth metal salts is contained as the polishing accelerator.

Inventors:
ITO YASUAKI (JP)
ODA HIROYUKI (JP)
NOGUCHI NAOTO (JP)
Application Number:
PCT/JP2018/010817
Publication Date:
September 27, 2018
Filing Date:
March 19, 2018
Export Citation:
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Assignee:
FUJIMI INC (JP)
International Classes:
C09K3/14; C09G1/02; H01L21/304
Domestic Patent References:
WO2012147605A12012-11-01
WO2013051555A12013-04-11
WO2017212971A12017-12-14
WO2013051555A12013-04-11
Foreign References:
JP2014044982A2014-03-13
JP2012253259A2012-12-20
JP2017057610A2017-03-23
JP2011159998A2011-08-18
JP2012253259A2012-12-20
Other References:
See also references of EP 3604475A4
Attorney, Agent or Firm:
ABE, Makoto (JP)
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