Title:
POLISHING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2023/189512
Kind Code:
A1
Abstract:
Provided is a polishing composition that can achieve an excellent polishing/removal rate for a polishing target. The polishing composition provided by the present invention is used for polishing a polishing target. The polishing composition contains water, sodium permanganate that functions as an oxidizer, and a transition metal salt that is different from the oxidizer. The oxidizer is contained in an amount more than 10 wt%. In some preferable modes, the transition metal salt is an oxy-transition metal salt or a multinuclear transition metal complex formed of a transition metal and oxygen and/or hydrogen. The polishing composition can be preferably applied for polishing of a polishing target that is composed of a high-hardness material having a Vickers hardness of 1500 Hv or more.
Inventors:
NAKAGAI YUICHIRO (JP)
Application Number:
PCT/JP2023/009728
Publication Date:
October 05, 2023
Filing Date:
March 13, 2023
Export Citation:
Assignee:
FUJIMI INC (JP)
International Classes:
C09G1/02; B24B37/00; C09K3/14; H01L21/304
Domestic Patent References:
| WO2017138308A1 | 2017-08-17 | |||
| WO2016084561A1 | 2016-06-02 | |||
| WO2021155324A1 | 2021-08-05 | |||
| WO2016072370A1 | 2016-05-12 |
Foreign References:
| US20220306902A1 | 2022-09-29 |
Attorney, Agent or Firm:
ABE, Makoto (JP)
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