Title:
POLISHING DEVICE AND POLISHING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/122580
Kind Code:
A1
Abstract:
To provide a polishing device capable of performing polishing by selecting a suitable polishing recipe on the basis of a state prior to the polishing, even in a situation where bevel portions have various shapes.
A polishing device 100 has: a holding/polishing unit 102 which holds and polishes a substrate W1; and a recognition unit 104 that recognizes data 104a relating to the state of an outer peripheral portion of the substrate W1 prior to performing the polishing. The holding/polishing unit 102 has: a holding unit 106 which holds and rotates the substrate W1; and a polishing unit 108 which polishes the outer peripheral portion of the substrate W1 by pressing a polishing member to the outer peripheral portion. A polishing condition determining unit 110 determines polishing conditions on the basis of the data 104a indicating which type the shape of the outer peripheral portion is among a plurality of types relating to the shape.
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Inventors:
NAKANISHI MASAYUKI (JP)
WATANABE TOSHIFUMI (JP)
KODERA KENJI (JP)
WATANABE TOSHIFUMI (JP)
KODERA KENJI (JP)
Application Number:
PCT/JP2017/000195
Publication Date:
July 20, 2017
Filing Date:
January 06, 2017
Export Citation:
Assignee:
EBARA CORP (JP)
International Classes:
B24B21/00; B24B9/00; B24B49/12; H01L21/304
Foreign References:
JP2008537316A | 2008-09-11 | |||
JP2004200527A | 2004-07-15 | |||
JP2014117782A | 2014-06-30 | |||
GB2337111A | 1999-11-10 | |||
JP2009111079A | 2009-05-21 | |||
JP2008042213A | 2008-02-21 | |||
JP2011161625A | 2011-08-25 |
Other References:
See also references of EP 3266565A4
Attorney, Agent or Firm:
ONO, Shinjiro et al. (JP)
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