Title:
POLISHING SOLUTION COMPOSITION FOR SAPPHIRE PLATE
Document Type and Number:
WIPO Patent Application WO/2015/170743
Kind Code:
A1
Abstract:
This polishing solution composition for a sapphire plate contains alumina particles, an anionic polymer, and an aqueous medium. One example of a manufacturing method for a sapphire plate according to the present invention includes a step in which the polishing solution composition for a sapphire plate is supplied to a sapphire plate to be polished and the sapphire plate to be polished is polished. Another example of a manufacturing method for a sapphire plate according to the present invention includes a step in which the polishing solution composition for a sapphire plate is supplied to the sapphire plate to be polished and the sapphire plate to be polished is polished, and a step in which a sapphire plate to be polished, which is different from the previous sapphire plate to be polished, is polished using the polishing solution composition for a sapphire plate used in the previous step.
Inventors:
YOSHINO TAIKI
Application Number:
PCT/JP2015/063315
Publication Date:
November 12, 2015
Filing Date:
May 08, 2015
Export Citation:
Assignee:
KAO CORP (JP)
International Classes:
C09K3/14; B24B37/00; C09G1/02; H01L21/304
Domestic Patent References:
| WO2013191139A1 | 2013-12-27 | |||
| WO2011136387A1 | 2011-11-03 |
Foreign References:
| JP2012000734A | 2012-01-05 | |||
| JP2014024960A | 2014-02-06 | |||
| JP2014024156A | 2014-02-06 | |||
| JP2012000700A | 2012-01-05 | |||
| JP2014024157A | 2014-02-06 |
Attorney, Agent or Firm:
IKEUCHI SATO & PARTNER PATENT ATTORNEYS (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)
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