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Patent Searching and Data


Title:
POLYIMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/140845
Kind Code:
A1
Abstract:
A modified polyimide resin including a structure represented by general formula (I). A polyimide resin including a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine compound, wherein the structural unit A includes, at a ratio of 60 mol% or more, a structural unit derived from a compound having a specific structure.

Inventors:
MIYAHARA DAICHI (JP)
SATO YUMI (JP)
Application Number:
PCT/JP2020/046718
Publication Date:
July 15, 2021
Filing Date:
December 15, 2020
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C08G73/10; C08L79/08; G03F7/027
Domestic Patent References:
WO2017030019A12017-02-23
WO2015163314A12015-10-29
WO2017030019A12017-02-23
WO2015163314A12015-10-29
Foreign References:
JP2014024894A2014-02-06
JP2000147768A2000-05-26
JP2007108761A2007-04-26
JP2006146244A2006-06-08
CN102807675A2012-12-05
JP2003168800A2003-06-13
JP2005015629A2005-01-20
JP2015134842A2015-07-27
CN102807675A2012-12-05
Other References:
See also references of EP 4089135A4
Attorney, Agent or Firm:
OHTANI PATENT OFFICE (JP)
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