POLYMER, COMPOSITION, PROCESSED SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SUBSTRATE, AND METHOD FOR MANUFACTURING MEMBER

WIPO Patent Application WO/2021/002234

A1

Provided are a polymer, a composition, a processed substrate, a method for manufacturing a processed substrate, and a method for manufacturing a member, whereby adhesion to the surface of the substrate can be improved, it is possible to form a liquid-repellent film in which the yield rate of a fine pattern is enhanced, and it is possible to remove the formed liquid-repellent film using a fluorine-based solvent without decreasing the performance of a functional member.　A polymer having a unit (u1), a unit (u2), and a unit (u3).　Unit (u1): a unit derived from a monomer m1 in which the surface energy of a homopolymer thereof is less than 25 mN/m. Unit (u2): a unit derived from a monomer m2 for which the absolute value of the difference between the octanol-water partition coefficient of the monomer before and after light exposure when the monomer together with a photoacid generator is exposed at a wavelength that decomposes the photoacid generator is 0.3 or greater. Unit (u3): a unit derived from a monomer m3 in which the surface energy of a homopolymer thereof is 25 mN/m or greater.

JPH01115913	EMULSION POLYMERIZATION SECONDARY-BUTYLACRYLATE LATEX SUITABLE FOR PRESSURE-SENSITIVE ADHESIVE AND PREPARATION THEREOF
JP7406320	Salt, acid generator, resist composition, and method for producing resist pattern

SAKURADA TOMOAKI (JP)
SASAKI TAKASHI (JP)
HIRANO RYO (JP)

PCT/JP2020/024401

January 07, 2021

June 22, 2020

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AGC INC (JP)

C08F220/18; C08F220/24; G03F7/038; G03F7/039; G03F7/09; G03F7/20

JP2017504817A

2017-02-09

T.S. PARTNERS et al. (JP)

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