POLYMER COMPOUND, AND RESIN COMPOSITION CONTAINING SAID COMPOUND

Title:

POLYMER COMPOUND, AND RESIN COMPOSITION CONTAINING SAID COMPOUND

Document Type and Number:

WIPO Patent Application WO/2022/009744

Kind Code:

A1

Abstract:

This polymer compound is represented by formula (1) (in the formula, R1 and R2 each independently denote a hydrogen atom or a methyl group. m and n are average numbers of repeating units, and each independently denote a real number within the range of 1 to 2000). The polymer compound has sufficient flexibility to be able to form a film, exhibits high adhesion to a low roughness copper foil, and has a low dielectric constant and dielectric loss tangent.

More Like This:

JPH0565315	NEW POLYMER
JP7338226	Resins, varnish compositions, printing inks and printed matter
WO/2013/131479	POLY(P-HYDROXY STYRENE) DERIVATE CONTAINING SULFONIUM SALT PHOTO-ACID GENERATOR GROUP, SYNTHESIS PROCESS AND USE THEREOF

Inventors:

AKATUKA YASUMASA (JP)
HAYASHIMOTO SHIGEO (JP)

Application Number:

PCT/JP2021/024697

Publication Date:

January 13, 2022

Filing Date:

June 30, 2021

Export Citation:

Click for automatic bibliography generation Help

Assignee:

NIPPON KAYAKU KK (JP)

International Classes:

C08F8/14; C08F212/08; C08K5/14; C08K5/3415; C08L25/14; C09J4/00; C09J7/00; C09J7/35

Foreign References:

JPH04198385A	1992-07-17
JP2017171744A	2017-09-28

Other References:

AZUMA, CHIAKI ET AL.: "Photo-polymerization and- copolymerization of Aromatic Diacrylates", POLYMER JOURNAL, vol. 4, no. 6, 1973, pages 628 - 636, XP055898152
T. NARASIMHASWAMY ET AL.: "Synthesis and Characterization of Phenyl Acrylates Gross-Linked to hydroquinone Diacrylate", MACROMOLECULES, vol. 25, 1992, pages 3338 - 3344

Attorney, Agent or Firm:

KAMIMURA Yoichiro (JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: LAVER CULTIVATION SUPPORT PILLAR AND PRODUCTION METHOD FOR SAME

Next Patent: BASE STATION DEVICE, TERMINAL DEVICE, AND COMMUNICATION METHOD