POLYMER MATERIAL AND METHOD FOR PRODUCING SAME

WIPO Patent Application WO/2020/179908

A9

Provided are: a polymer material which has self-repairability and excellent elasticity as well as high flexibility for designing elasticity, strength, and hardness, and moreover can be produced in a simple manner; and a method for producing the same.　This polymer material includes a polymer having a host group and a guest group. The host group is a monovalent group in which a hydrogen atom or a hydroxyl group is removed from a cyclodextrin derivative, wherein the cyclodextrin derivative has a structure in which a hydrogen atom of at least one hydroxyl group contained in a cyclodextrin is substituted with at least one group selected from the group consisting of a hydrocarbon group, an acyl group, and -CONHR. The polymer is a polymer of a monomer mixture including a host group-containing polymerizable monomer, a guest group-containing polymerizable monomer, and a third polymerizable monomer, wherein the third polymerizable monomer contains a (meth)acrylic ester compound. The host group-containing polymerizable monomer and the guest group-containing polymerizable monomer have the property of being dissolved in the third polymerizable monomer.

HARADA AKIRA (JP)
YAMAGUCHI HIROYASU (JP)
TAKASHIMA YOSHINORI (JP)
OSAKI MOTOFUMI (JP)
OHASHI YASUMASA (JP)
TAKAHASHI HIROAKI (JP)
SHIRAKAWA HIDENORI (JP)

PCT/JP2020/009666

October 29, 2020

March 06, 2020

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UNIV OSAKA (JP)
YUSHIRO CHEMICAL IND CO LTD (JP)

C08F220/58; C08F220/18; C08F220/26; C08F220/56

SAEGUSA & PARTNERS (JP)

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