Title:
POLYMER AND METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION FOR RESISTS
Document Type and Number:
WIPO Patent Application WO/2021/029310
Kind Code:
A1
Abstract:
[Problem] The present invention provides: a polymer which comprises a structural unit derived from p-hydroxystyrene and a structural unit having such a structure that a carboxylic acid is protected by an acetal group, and which contains an extremely small amount of a structural unit generated as the result of the detachment of the acetal group or the migration of the acetal group during the process of the production of the polymer; and a method for producing the polymer. [Solution] A solution which contains a polymer comprising a structural unit derived from a p-acetoxystyrene and a structural unit having such a structure that a carboxylic acid is protected by an acetal group is subjected to a deprotection reaction at 50℃ or lower in the presence of a base for which a conjugate acid has a pKa value of 12 or more.
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Inventors:
AIHARA HIROMICHI (JP)
MASUKAWA TOMOHIRO (JP)
MASUKAWA TOMOHIRO (JP)
Application Number:
PCT/JP2020/030120
Publication Date:
February 18, 2021
Filing Date:
August 06, 2020
Export Citation:
Assignee:
MARUZEN PETROCHEM CO LTD (JP)
International Classes:
C08F8/12; C08F212/14; C08F220/26; G03F7/039
Domestic Patent References:
| WO2018079203A1 | 2018-05-03 |
Foreign References:
| JP2007086284A | 2007-04-05 | |||
| JP2009086354A | 2009-04-23 | |||
| JP2004045448A | 2004-02-12 | |||
| JPH02311505A | 1990-12-27 | |||
| JPH11310611A | 1999-11-09 | |||
| JP2001281864A | 2001-10-10 |
Attorney, Agent or Firm:
NAKAMURA Yukitaka et al. (JP)
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