Title:
POLYMER AND POSITIVE RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/168370
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a polymer which is capable of forming a resist pattern having excellent dry etching resistance when used as a main chain scission type positive resist. This polymer comprises a monomer unit (A) represented by formula (I) and a monomer unit (B) represented by formula (II). In formula (I), B is a bridged cyclic saturated hydrocarbon cyclic group which may have a substituent and n is 0 or 1. In formula (II), R1 is an alkyl group and p is an integer from 0 to 5, and when there is a plurality of R1s, they may be the same or different.
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Inventors:
TSUTSUMI TAKASHI (JP)
Application Number:
PCT/JP2018/006272
Publication Date:
September 20, 2018
Filing Date:
February 21, 2018
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
C08F220/22; C08F212/06; G03F7/039
Foreign References:
| JP2002040661A | 2002-02-06 | |||
| JP2001201854A | 2001-07-27 | |||
| JP2016012104A | 2016-01-21 | |||
| JP2016074897A | 2016-05-12 | |||
| JP2011085814A | 2011-04-28 | |||
| JP2011085811A | 2011-04-28 |
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
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