Title:
POLYMERIC THIN FILM HAVING SILSESQUIOXANE, FINE STRUCTURE, AND PROCESSES FOR PRODUCING THESE
Document Type and Number:
WIPO Patent Application WO/2012/043114
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a polymeric thin film having a structure which is finer than conventional polymeric thin films and which has excellent regularity throughout a wide range and has few defects; a fine structure; and processes for producing the polymeric thin film and the fine structure.
This process for producing the polymeric thin film comprises thermally annealing a polymer-block copolymer on a substrate to cause the copolymer to undergo micro phase separation and to regularly arrange a plurality of microdomains which include a second segment of the polymer-block copolymer as a component thereof, in a continuous phase which includes a first segment of the polymer-block copolymer as a component thereof, the second segment of the polymer-block copolymer having a silsesquioxane skeleton bonded to the main chain of the polymer-block copolymer through an organic group which comprises an alkyl chain represented by the formula -(CH2)n- (wherein n is an integer satisfying 5≤n≤24).
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Inventors:
TADA YASUHIKO (JP)
YOSHIDA HIROSHI (JP)
HAYAKAWA TERUAKI (JP)
ISHIDA YOSHIHITO (JP)
YOSHIDA HIROSHI (JP)
HAYAKAWA TERUAKI (JP)
ISHIDA YOSHIHITO (JP)
Application Number:
PCT/JP2011/069682
Publication Date:
April 05, 2012
Filing Date:
August 31, 2011
Export Citation:
Assignee:
HITACHI LTD (JP)
TADA YASUHIKO (JP)
YOSHIDA HIROSHI (JP)
HAYAKAWA TERUAKI (JP)
ISHIDA YOSHIHITO (JP)
TADA YASUHIKO (JP)
YOSHIDA HIROSHI (JP)
HAYAKAWA TERUAKI (JP)
ISHIDA YOSHIHITO (JP)
International Classes:
C08J5/18; B32B27/00; B82Y30/00; B82Y40/00; C08F293/00; C08J9/26
Foreign References:
| JP2010056256A | 2010-03-11 | |||
| JP2010144120A | 2010-07-01 | |||
| JP2009114409A | 2009-05-28 | |||
| JP2000286479A | 2000-10-13 |
Other References:
TERUAKI HAYAKAWA: "Material Development for Silsesquioxane Containing Block Copolymer Lithography", JAPANESE JOURNAL OF POLYMER SCIENCE AND TECHNOLOGY, vol. 66, no. 8, 25 August 2009 (2009-08-25), pages 321 - 330
Attorney, Agent or Firm:
ASAMURA PATENT OFFICE, p. c. (JP)
Patent business corporation Asamura patent firm (JP)
Patent business corporation Asamura patent firm (JP)
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Claims: