Title:
POLYMERIZABLE-UNSATURATED-GROUP-CONTAINING ALKALI-SOLUBLE RESIN, METHOD FOR PRODUCING SAME, PHOTOSENSIVE RESIN COMPOSITION, AND CURED PRODUCT THEREOF
Document Type and Number:
WIPO Patent Application WO/2021/235299
Kind Code:
A1
Abstract:
Provided are: a photosensitive resin composition capable of patterning at exceptional resolution by alkaline development, the photosensitive resin composition yielding a cured product that can be applied to an insulating film, etc., having exceptional chemical resistance and also exceptional reliability such as seam folding resistance; a polymerizable-unsaturated-group-containing alkali-soluble resin used in said photosensitive resin composition; and a method for producing said resin. A method for producing a polymerizable-unsaturated-group-containing alkali-soluble resin, the method being characterized in that an epoxy (meth)acrylate resin represented by general formula (1) is reacted with a dicarboxylic acid, tricarboxylic acid, or acid anhydride thereof and a tetracarboxylic acid or an acid dianhydride thereof. Herein, R1 represents a C1-8 alkyl group, a phenyl group, or an allyl group, R2 represents a hydrogen atom or a dicyclopentenyl group, and R3 represents a hydrogen atom or a methyl group.
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Inventors:
SOH MASAHIRO (JP)
ISHIHARA KAZUO (JP)
YU KIHWAN (KR)
LIM CHEONGRAE (KR)
ISHIHARA KAZUO (JP)
YU KIHWAN (KR)
LIM CHEONGRAE (KR)
Application Number:
PCT/JP2021/018120
Publication Date:
November 25, 2021
Filing Date:
May 12, 2021
Export Citation:
Assignee:
NIPPON STEEL CHEMICAL & MAT CO LTD (JP)
KUKDO CHEMICAL CO LTD (KR)
KUKDO CHEMICAL CO LTD (KR)
International Classes:
C08G59/17; C08F290/06; C08F299/02; C08G63/676; G03F7/027; G03F7/038
Domestic Patent References:
WO2020129724A1 | 2020-06-25 |
Foreign References:
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Attorney, Agent or Firm:
SASAKI Kazuya et al. (JP)
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