Title:
POLYORGANOSILOXANE
Document Type and Number:
WIPO Patent Application WO/2023/153871
Kind Code:
A1
Abstract:
The present application may provide a polyorganosiloxane and a release composition enabling a release layer to be formed, the release layer capable of securing solvent resistance by maximizing bonding strength between a base film and the release layer. In addition, the present application may provide a polyorganosiloxane and a release composition enabling a release layer to be formed, the release layer having appropriate peeling force even under room temperature and high temperature conditions, having little change in peeling force even under high temperature and ultraviolet irradiation conditions, and securing excellent residual adhesion. Furthermore, as an application of the polyorganosiloxane and the release composition, the present application may provide a release layer, and a release film and an adhesive film including the release layer.
Inventors:
PARK JUN HYOUNG (KR)
KIM HYUN CHEOL (KR)
KIM HYUN CHEOL (KR)
Application Number:
PCT/KR2023/002013
Publication Date:
August 17, 2023
Filing Date:
February 10, 2023
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
C08K5/5419; C08G77/12; C08G77/20; C08K5/544; C08K5/56; C08L83/04; C09D7/63; C09D183/04
Foreign References:
| JP5860622B2 | 2016-02-16 | |||
| KR20110013891A | 2011-02-10 | |||
| KR20110084601A | 2011-07-26 | |||
| KR20150131109A | 2015-11-24 | |||
| US20160244606A1 | 2016-08-25 |
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
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