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Patent Searching and Data


Title:
POLYPHENOL COMPOUNDS, ESTERIFIED QUINONE DIAZIDES, AND POSITIVE PHOTORESIST COMPOSITIONS
Document Type and Number:
WIPO Patent Application WO/2004/092103
Kind Code:
A1
Abstract:
Bis(2,5-dimethyl-3-(2-hydroxy-5-ethylbenzyl)-4-hydroxyphenyl) methane, quinone diazides esterified therewith, and so on. These compounds are useful for positive photoresist compositions, and can give positive photoresist compositions which exhibit high resolution, high sensitivity and wide exposure latitude.

Inventors:
HAGIHARA MITSUO (JP)
DOI KOUSUKE (JP)
KOHARA HIDEKATSU (JP)
NAKAYAMA TOSHIMASA (JP)
NAKAJIMA TETSUYA (JP)
Application Number:
PCT/JP1998/003472
Publication Date:
October 28, 2004
Filing Date:
August 04, 1998
Export Citation:
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Assignee:
HAGIHARA MITSUO (JP)
DOI KOUSUKE (JP)
KOHARA HIDEKATSU (JP)
NAKAYAMA TOSHIMASA (JP)
NAKAJIMA TETSUYA (JP)
International Classes:
C07C39/15; C07C309/71; C07C309/74; C07C309/76; G03F7/004; G03F7/022; H01L21/027; (IPC1-7): C07C39/15; G03F7/022
Foreign References:
JPH08245461A1996-09-24
Attorney, Agent or Firm:
Soga, Michiteru (Kokusai Building 8th floor, 1-1, Marunouchi 3-chom, Chiyoda-ku Tokyo, JP)
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