Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
POLYURETHANE FILM AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2018/128156
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a polyurethane film in which the delamination of a polyurethane layer that occurs when the polyurethane film is used in cold climates is alleviated; and a method for manufacturing the polyurethane film. This polyurethane film contains polyurethane and silicon atoms, and is characterized by satisfying equation (1) below. (1) 1

Inventors:
KAWANAMI AKITO (JP)
Application Number:
PCT/JP2017/047153
Publication Date:
July 12, 2018
Filing Date:
December 28, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
C08J5/18; B32B27/40; C08J7/043; C08K5/54; C08L75/04; C08L83/04
Domestic Patent References:
WO2015148366A12015-10-01
Foreign References:
JPH0516174A1993-01-26
JP2010196034A2010-09-09
JP2007138326A2007-06-07
JP2017177742A2017-10-05
Attorney, Agent or Firm:
KOYO INTERNATIONAL PATENT FIRM (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: POLYETHER POLYOL PRODUCTION METHOD AND POLYURETHANE FOAM PRODUCTION METHOD

Next Patent: ELECTRONIC DEVICE