Title:
POSITION MEASUREMENT METHOD, EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2003/104746
Kind Code:
A1
Abstract:
A position measurement method includes a step of illuminating a mark formed on an object by an illumination beam, a step of imaging a beam generated from the mark via an observation system, and a step of processing the imaging signal so as to measure the position information associated with the mark position. The signal processing is performed according to information on a noise containing a light-quantity-dependent component contained in the imaging signal and the imaging signal. As a result, it is possible to accurately measure the mark position information even when the imaging signal contains a noise.
Inventors:
KOBAYASHI MITSURU (JP)
Application Number:
PCT/JP2003/006941
Publication Date:
December 18, 2003
Filing Date:
June 02, 2003
Export Citation:
Assignee:
NIPPON KOGAKU KK (JP)
KOBAYASHI MITSURU (JP)
KOBAYASHI MITSURU (JP)
International Classes:
G03F9/00; (IPC1-7): G01B11/00; H01L21/027; G03F9/00
Foreign References:
| JPH01125823A | 1989-05-18 | |||
| JPH11238668A | 1999-08-31 |
Attorney, Agent or Firm:
Shiga, Masatake (2-3-1 Yaesu Chuo-ku, Tokyo, JP)
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