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Title:
POSITIVE PHOTORESIST AND PREPARATION METHOD, PREPARATION METHOD FOR GLASS HOUSING, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/024783
Kind Code:
A1
Abstract:
A positive photoresist, a preparation method therefor, a preparation method for a housing, and an electronic device (200). The positive photoresist comprises a phenolic resin, a photosensitizer, an auxiliary agent, and a solvent, the weight average molecular weight of the phenolic resin is greater than or equal to 18,000, the auxiliary agent comprises a crosslinking agent, and the structural formula of the crosslinking agent is as shown in formula (I): formula (I). The positive photoresist has excellent acid resistance, adhesion performance and thermal stability, can protect the surface of glass that does not need to be etched during the process of etching the glass using an acid etching solution, and can be stably placed in the acid etching solution for a long time, facilitating strengthening of the etching depth of the surface of the glass, thereby making the glass etching effect more obvious.

Inventors:
AO YUYIN (CN)
ZHANG TAO (CN)
QIU JINGLONG (CN)
HAN ZE (CN)
ZHAN JIANBO (CN)
ZHENG JUNWEI (CN)
Application Number:
PCT/CN2022/107387
Publication Date:
March 02, 2023
Filing Date:
July 22, 2022
Export Citation:
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Assignee:
GUANGDONG OPPO MOBILE TELECOMMUNICATIONS CORP LTD (CN)
International Classes:
G03F7/039; H05K5/02
Domestic Patent References:
WO2021171697A12021-09-02
WO2021060060A12021-04-01
Foreign References:
CN113671794A2021-11-19
CN108779331A2018-11-09
US20120296053A12012-11-22
CN102292675A2011-12-21
JP2017179364A2017-10-05
Attorney, Agent or Firm:
SCIHEAD IP LAW FIRM (CN)
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