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Title:
POWDER SURFACE TREATMENT APPARATUS AND POWDER SURFACE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2011/010620
Kind Code:
A1
Abstract:
Disclosed are a novel powder surface treatment apparatus and a novel powder surface treatment method, both of which enable the surfaces of powder particles to be treated within a short period and with high efficiency. The powder surface treatment apparatus comprises: a container (20) into which a liquid (30) is to be filled; a first electrode (40) which is placed a predetermined distance away from the surface of the liquid; a second electrode which is so arranged as to be electrically connected to the liquid (30) when the liquid (30) is filled in the container; and an electrical power source (50) which is connected to the first and second electrodes. The powder surface treatment apparatus is characterized by being so adapted that the liquid (30) is filled, powder (P) to be treated is placed on the surface of the liquid, and a voltage is then applied to the first and second electrodes, thereby causing the generation of plasma in a space between the first electrode and the surface of the liquid.

Inventors:
TAGUCHI KOHSHI (JP)
Application Number:
PCT/JP2010/062111
Publication Date:
January 27, 2011
Filing Date:
July 16, 2010
Export Citation:
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Assignee:
SAKIGAKE SEMICONDUCTOR CO LTD (JP)
TAGUCHI KOHSHI (JP)
International Classes:
B01J19/08; B01J2/00
Foreign References:
JPH06134296A1994-05-17
JP2003300716A2003-10-21
JP2006216468A2006-08-17
JP2005274058A2005-10-06
Attorney, Agent or Firm:
MORIWAKI, Masashi et al. (JP)
Masashi Moriwaki (JP)
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