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Patent Searching and Data


Title:
POWER SOURCE ASSEMBLY, AND PLASMA IMMERSION ION IMPLANTATION DEVICE AND METHOD FOR USING SAME
Document Type and Number:
WIPO Patent Application WO/2023/025179
Kind Code:
A1
Abstract:
Disclosed in the present application are a power source assembly, and a plasma immersion ion implantation device and a method for using same. The power source assembly comprises a housing, a first power source, a second power source, and an output interface, wherein the first power source and the second power source are integrated into the housing, and the output interface is arranged at the housing; the first power source is connected to the output interface, and the second power source is connected to the output interface; and the first power source is used for outputting a first direct-current voltage signal, the second power source is used for outputting a pulse voltage signal, and the output interface is used for outputting the first direct-current voltage signal, the pulse voltage signal or a superposed signal, the superposed signal being formed by superposing the first direct-current voltage signal and the pulse voltage signal. The solution can solve the problem in the related art that the layout of a multi-power-source structure generates a relatively strong parasitic inductance capacitance which affects the process quality.

Inventors:
WANG JINGYUAN (CN)
WEI GANG (CN)
TIAN FENG (CN)
CHEN XING (CN)
GE JUN (CN)
ZHANG YING (CN)
ZHAO JINRONG (CN)
Application Number:
PCT/CN2022/114426
Publication Date:
March 02, 2023
Filing Date:
August 24, 2022
Export Citation:
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Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
H05K5/02
Foreign References:
CN105080722A2015-11-25
CN205231778U2016-05-11
CN204620218U2015-09-09
CN208862566U2019-05-14
CN112054786A2020-12-08
CN113727554A2021-11-30
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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