Title:
POWER SUPPLY DEVICE FOR PLASMA GENERATION
Document Type and Number:
WIPO Patent Application WO/2018/128235
Kind Code:
A1
Abstract:
Disclosed is a power supply device for plasma generation, which is a power supply device for plasma generation which supplies a high frequency signal amplified to have energy for plasma generation, the power supply device comprising: a frequency generator for generating a signal having a frequency of the high frequency signal; a power amplifier for amplifying power of the signal generated from the frequency generator, and providing same to an output terminal of the power supply device; a power sensor for detecting forward power provided from the power amplifier to the output terminal, and reflected power reflected from a load, connected to the output terminal, to the output terminal; a voltage comparator for comparing the forward power and the reflected power detected by the power sensor, and generating a comparison value corresponding to the size of transmission power transferred from the power supply device to the load; and a voltage comparator for comparing the comparison value, generated by the voltage comparator, against a preconfigured reference voltage value, and, based on the result, controlling the size of a gain of the power amplifier.
Inventors:
PARK SEUNG JIN (KR)
KWON SOON KU (KR)
KWON SOON KU (KR)
Application Number:
PCT/KR2017/007903
Publication Date:
July 12, 2018
Filing Date:
July 21, 2017
Export Citation:
Assignee:
MEDIPL CO LTD (KR)
International Classes:
H01J37/32; H05H1/46
Domestic Patent References:
| WO2014034318A1 | 2014-03-06 |
Foreign References:
| US6472822B1 | 2002-10-29 | |||
| US20120249165A1 | 2012-10-04 | |||
| KR920003621B1 | 1992-05-04 | |||
| KR101293877B1 | 2013-08-07 |
Attorney, Agent or Firm:
YOU ME PATENT AND LAW FIRM (KR)
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