PRECURSOR COMPOSITION CONTAINING GROUP IV ORGANIC COMPOUND AND METHOD FOR FORMING THIN FILM USING SAME

Title:

PRECURSOR COMPOSITION CONTAINING GROUP IV ORGANIC COMPOUND AND METHOD FOR FORMING THIN FILM USING SAME

Document Type and Number:

WIPO Patent Application WO/2017/086630

Kind Code:

A1

Abstract:

A precursor composition according to an embodiment of the present invention contains a mixture of a Group IV organic compound and any one compound selected from an organic aluminum compound, an organic gallium compound, or an organic germanium compound.

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Inventors:

LEE GEUN-SU (KR)
LEE YEONG-MIN (KR)

Application Number:

PCT/KR2016/012456

Publication Date:

May 26, 2017

Filing Date:

November 01, 2016

Export Citation:

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Assignee:

EUGENETECH MAT CO LTD (KR)

International Classes:

C09D4/00; C07F5/06; C07F7/00; C07F7/30; H01L21/02; H01L21/205; H01L51/00

Foreign References:

KR101311801B1	2013-09-25
US5209952A	1993-05-11
KR20150108779A	2015-09-30
KR20150101318A	2015-09-03
KR20140075623A	2014-06-19

Other References:

TASCHNER, CH: "Plasma enhanced deposition of titanium aluminium composite films using organometallic aluminium precursors", SURFACE AND COATINGS TECHNOLOGY, vol. 98, no. 1-3, January 1998 (1998-01-01), pages 925 - 933, XP055596237, ISSN: 0257-8972, DOI: 10.1016/S0257-8972(97)00313-7

Attorney, Agent or Firm:

JEONG, Seong-Jin (KR)

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