Title:
PREPARATION METHOD FOR BLACK MATRIX AND DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/118937
Kind Code:
A1
Abstract:
A preparation method for a black matrix and a display device (20), comprising: providing a substrate (21) (S1); coating the upper surface of the substrate (21) with a layer of refractive index temperature control materials (S2); pre-baking the refractive index temperature control materials to form an intermediate layer (22) (S3); coating the intermediate layer (22) with a photoresist material to form a photoresist layer (23) (S4); placing a mask (24) above the photoresist layer (23) or below the substrate (21) (S5); irradiating the photoresist layer (23) by using ultraviolet rays from top to bottom or irradiating the substrate (21) from bottom to top to achieve simultaneous curing and developing of the intermediate layer (22) and the photoresist layer (23) (S6); removing the mask (24) and baking the substrate (21) to achieve simultaneous patterning of the intermediate layer (22) and the photoresist layer (23) (S7). In this way, the preparation efficiency can be improved.
Inventors:
CHEN LIXUAN (CN)
Application Number:
PCT/CN2019/078210
Publication Date:
June 18, 2020
Filing Date:
March 15, 2019
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
G02F1/1335; G02F1/1333; G03F9/00
Foreign References:
| CN105308484A | 2016-02-03 | |||
| CN105308484A | 2016-02-03 | |||
| CN107728373A | 2018-02-23 | |||
| CN103926743A | 2014-07-16 | |||
| CN102257426A | 2011-11-23 | |||
| CN105026963A | 2015-11-04 | |||
| JPH06331817A | 1994-12-02 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
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