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Patent Searching and Data


Title:
PREPARATION METHOD FOR THIN-FILM CAPACITOR, AND THIN-FILM CAPACITOR
Document Type and Number:
WIPO Patent Application WO/2022/040987
Kind Code:
A1
Abstract:
Disclosed in the present application are a preparation method for a thin-film capacitor, and the thin-film capacitor. The preparation method comprises: providing a substrate; sequentially forming a sacrificial layer, a dielectric film layer, a first electrode layer and a capacitor base layer on the substrate; removing the substrate and the sacrificial layer; forming a second electrode layer on the side of the dielectric film layer away from the first electrode layer to obtain a thin-film capacitor structure; and packaging the thin-film capacitor by adopting a 3D printing technology. According to the method, the thin-film capacitor with high voltage resistance, long service life, stable temperature characteristic and low loss can be prepared, and can be applied to various related electronic devices, large-scale integrated circuits and the like.

Inventors:
JIA TINGTING (CN)
HU FANG (CN)
FANG WEI (CN)
DING ZHEN (CN)
YU SHUHUI (CN)
SUN RONG (CN)
Application Number:
PCT/CN2020/111447
Publication Date:
March 03, 2022
Filing Date:
August 26, 2020
Export Citation:
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Assignee:
SHENZHEN INST OF ADV TECH CAS (CN)
International Classes:
H01G4/33
Foreign References:
CN105006362A2015-10-28
CN105742060A2016-07-06
CN109622968A2019-04-16
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
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