Title:
PRETREATMENT PROCESS FOR PREPARING TIO2 DIELECTRIC LAYER-CONTAINING ELECTRONIC ALUMINUM FOIL
Document Type and Number:
WIPO Patent Application WO/2020/048045
Kind Code:
A1
Abstract:
Disclosed is a pre-treatment process for preparing a TiO2 dielectric layer-containing formed foil: a pre-formation treated etched foil is thermally treated at 400-500 °C in a muffle furnace for 30-120 s and then retrieved; then immersed in a mixture of which the pH value is 1.2-2.0 and containing titanium sulfate, acetic acid, and sulfuric acid, where the Ti element concentration is 0.1-0.5 mol/L, the temperature of the mixture is 50 °C to 70 °C, and the immersion time is 2-5 min; when retrieved, rinsed with purified water and preheated to 300-400 °C, and heated in a 2.45 GHz industrial microwave oven for 2-3 min to complete the process. The TiO2 dielectric layer-containing formed foil can be produced simply from the formation of the etched foil pre-treated as described above according to a conventional multi-level formation process, the described pretreatment often only needs to be performed once when producing a low-voltage section formed foil (Vf ≤ 520 V), and the described pretreatment process is added as required after different levels of formation process when producing an increased voltage section product.
Inventors:
WANG JIANZHONG (CN)
MAO HUIMING (CN)
GAO ZHIHUA (CN)
MAO HUIMING (CN)
GAO ZHIHUA (CN)
Application Number:
PCT/CN2018/121671
Publication Date:
March 12, 2020
Filing Date:
December 18, 2018
Export Citation:
Assignee:
NANTONG HAIXING ELECTRONICS LLC (CN)
NANTONG HAIYI ELECTRONICS CO LTD (CN)
NINGXIA HAILI ELECTRONICS CO LTD (CN)
NANTONG HAIYI ELECTRONICS CO LTD (CN)
NINGXIA HAILI ELECTRONICS CO LTD (CN)
International Classes:
H01G9/045; C25D11/10; C25D11/16; H01G9/055
Foreign References:
CN101707141A | 2010-05-12 | |||
CN107993846A | 2018-05-04 | |||
JP2000286164A | 2000-10-13 | |||
CN106245087A | 2016-12-21 | |||
CN104593848A | 2015-05-06 | |||
TW200644012A | 2006-12-16 |
Other References:
XIAO, QINGGUO: "Preparation and Study of Composite Dielectric Film with High Dielectric Constant", SCIENCE -ENGINEERING (B) CHINA MASTER'S THESES FULL-TEXT DATABASES, no. 1, 15 March 2005 (2005-03-15), pages c028-13, ISSN: 1671-6779
Attorney, Agent or Firm:
NANJING ZHENGLIAN INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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