PROBE ASSESSMENT METHOD AND SPM

WIPO Patent Application WO/2022/137600

A1

This method is for assessing a probe by measuring, on an electronic microscope, a known sample having a known shape by use of the probe. A projection part is formed on the surface of the known sample, and has a shape tapered toward a vertex. The method comprises: a step (S8) for comparing the circle equivalent radius (R) of the projection part with a first threshold value (P) upon measurement of the circle equivalent radius (R); a step (S10) for determining that the probe is satisfactory when the width thereof is less than the first threshold value (P); and a step (S12) for determining that the probe is unsatisfactory when the width thereof is the first threshold value (P) or more.

JP2920990	[Title of the Invention] A reference lattice plate for measuring depth and lateral magnification or image dimensions of a scanning electron microscope, a tunnel scanning microscope, or the like.
WO/2020/022893	SYSTEM AND METHOD OF PERFORMING SCANNING PROBE MICROSCOPY ON A SUBSTRATE SURFACE
JP3665472	STANDARD SAMPLE FOR SCANNING PROBE MICROSCOPE AND ITS PRODUCTION

ARAI HIROSHI (JP)
NAKAJIMA HIDEO (JP)
YAMASAKI KENJI (JP)
IIDA EIJI (JP)
KOGURE AKINORI (JP)

PCT/JP2021/021849

June 30, 2022

June 09, 2021

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SHIMADZU CORP (JP)

G01Q40/02; G01Q60/38

JP2006308312A	2006-11-09
JP2006308313A	2006-11-09
KR20080069325A	2008-07-28
JP2007078679A	2007-03-29
US6489611B1	2002-12-03
US6545273B1	2003-04-08
JP2001165844A	2001-06-22

ANONYMOUS: "JISR1683:2014 Method for measuring surface roughness of fine ceramic thin films by atomic force microscope", JIS R1683, 1 January 2014 (2014-01-01), pages 1 - 17, XP055951304, Retrieved from the Internet [retrieved on 20220815]

FUKAMI PATENT OFFICE, P.C. (JP)

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