PROCESS DETERMINATION DEVICE FOR SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, PROCESS DETERMINATION METHOD FOR SUBSTRATE PROCESSING DEVICE, AND GROUP OF LEARNING MODELS

WIPO Patent Application WO/2020/178945

A1

[Problem] To provide a process determination device, for example, for a substrate processing device, the process determination device making it possible to easily inhibit a decrease in determination accuracy. [Solution] A process determination device 20 is provided with a process log acquiring unit 21 which acquires process log data of a substrate processing device 10, and a determination unit 22 which creates input data on the basis of the process log data and makes a determination based on the input data concerning a process of the substrate processing device. The determination unit is provided with a plurality of learning models 25 into each of which the input data is input and each of which outputs a determination result concerning the process, wherein the plurality of learning models are generated by performing machine learning using mutually different training data. The determination unit is capable of switching which one of the plurality of learning models is to be used for making the determination.

HANADA KATSUJI (JP)
FUJIWARA YUKI (JP)

PCT/JP2019/008393

September 10, 2020

March 04, 2019

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SPP TECH CO LTD (JP)

H01L21/3065

WO2018189796A1	2018-10-18
WO2010050334A1	2010-05-06

JP2001134763A	2001-05-18
JPH0758015A	1995-03-03
JP2018106237A	2018-07-05
JP2012159886A	2012-08-23
JP2018045559A	2018-03-22

MAKOTO INTERNATIONAL PATENT ATTORNEYS OFFICE (JP)

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