Title:
PROCESS FOR MANUFACTURING GAS BARRIER FILM AND SURFACE MODIFICATION METHOD
Document Type and Number:
WIPO Patent Application WO/2014/175029
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a process for manufacturing a gas barrier film, said process enabling continuous production and being capable of minimizing the reduction in illuminance or lifetime of an excimer lamp and forming a gas barrier layer stably; and a surface modification method which is to be applied thereto. This process for manufacturing a gas barrier film includes: applying a coating liquid that contains a polysilazane compound to at least one surface of a substrate to form a polysilazane layer; and passing the substrate provided with the polysilazane layer continuously through a surface modification section equipped with excimer lamps which emit an excimer radiation, and thus irradiating the polysilazane layer with the excimer radiation to conduct surface modification for modifying a gas barrier layer. The process is characterized in that, during the surface modification, the average water vapor concentration in a space region between the excimer lamps and the substrate is controlled to 150 to 930ppm.
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Inventors:
ARITA HIROAKI (JP)
HIROSE TATSUYA (JP)
HIROSE TATSUYA (JP)
Application Number:
PCT/JP2014/059796
Publication Date:
October 30, 2014
Filing Date:
April 03, 2014
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B05D7/24; B05D3/06; H01J65/00; H01J65/04
Domestic Patent References:
| WO2011007543A1 | 2011-01-20 |
Foreign References:
| JP2012016854A | 2012-01-26 |
Attorney, Agent or Firm:
KOYO INTERNATIONAL PATENT FIRM (JP)
Patent business corporation Mitsuaki international patent firm (JP)
Patent business corporation Mitsuaki international patent firm (JP)
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