Title:
PROCESS FOR PRODUCING DIPHENYL SULFONE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2002/057221
Kind Code:
A1
Abstract:
A process by which a high-purity 4,4'-dihydroxydiphenyl sulfone monoether can be industrially advantageously obtained. The process, which is for producing a compound represented by the formula (I) (I) (wherein R?1¿ and R?2¿ each independently represents halogeno, C¿1-8? alkyl, or C¿2-8? alkenyl; m and n each independently is an integer of 0 to 4; and R?3¿ represents C¿1-8? alkyl, C¿2-8? alkenyl, C¿3-8? cycloalkyl, or optionally substituted aralkyl), comprises (1) conducting pH adjustment two or more times in a purification step, (2) removing the alkyl halide used in excess, (3) using a solvent, e.g., water, having an iron content of 0.05 ppm or lower, (4) using a vessel coated inside with a corrosion-resistant layer, (6) adding a chelating agent, and (7) using a means for drying with mechanical stirring.
Inventors:
KATSUURA KIYOSHI (JP)
HIDAKA TOMOYA (JP)
TAKASHINA YUTAKA (JP)
OHNUKI YASUO (JP)
HIDAKA TOMOYA (JP)
TAKASHINA YUTAKA (JP)
OHNUKI YASUO (JP)
Application Number:
PCT/JP2002/000410
Publication Date:
July 25, 2002
Filing Date:
January 22, 2002
Export Citation:
Assignee:
NIPPON SODA CO (JP)
IBARAKIKASEI CHEMICALS CO LTD (JP)
KATSUURA KIYOSHI (JP)
HIDAKA TOMOYA (JP)
TAKASHINA YUTAKA (JP)
OHNUKI YASUO (JP)
IBARAKIKASEI CHEMICALS CO LTD (JP)
KATSUURA KIYOSHI (JP)
HIDAKA TOMOYA (JP)
TAKASHINA YUTAKA (JP)
OHNUKI YASUO (JP)
International Classes:
C07C315/06; C07C317/22; (IPC1-7): C07C315/04; C07C317/22
Domestic Patent References:
WO1991011433A1 | 1991-08-08 |
Foreign References:
JPH03258760A | 1991-11-19 | |||
JPS6056949A | 1985-04-02 | |||
JP2001011001A | 2001-01-16 | |||
US5414149A | 1995-05-09 | |||
JPH11124362A | 1999-05-11 |
Other References:
See also references of EP 1273570A4
Attorney, Agent or Firm:
Tokai, Yusaku c/o Nippon Soda Co. (Ltd. 2-1 Ohtemachi 2-chome Chiyoda-ku, Tokyo, JP)
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