Title:
PROCESS FOR PRODUCTION OF POLYHYDROXYIMIDE
Document Type and Number:
WIPO Patent Application WO/2010/123066
Kind Code:
A1
Abstract:
Disclosed is a convenient process for producing a polyhydroxyimide.
Specifically disclosed is a process for producing a polyhydroxyimide, which is characterized by adding at least one compound represented by formula (2) or (3) (wherein R1 to R4 or R5 to R8 independently represent a hydrogen atom, a monovalent organic group, or the like; and m represents a natural number) to a polyhydroxyimide precursor having a repeating structure represented by formula (1) (wherein X represents a tetravalent aliphatic group or an aromatic group; Y represents an organic group containing an aromatic group substituted by at least one OH group; and n represents an integer of 1 or greater), and heating the resulting mixture to a temperature of 50°C or higher to produce a polyimide having a weight average molecular weight of 5,000 to 100,000 in terms of polystyrene as measured by gel permeation chromatography (GPC).
Inventors:
EBARA KAZUYA (JP)
Application Number:
PCT/JP2010/057151
Publication Date:
October 28, 2010
Filing Date:
April 22, 2010
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
EBARA KAZUYA (JP)
EBARA KAZUYA (JP)
International Classes:
C08G73/10; G03F7/004; G03F7/023
Foreign References:
JP2009024033A | 2009-02-05 | |||
JP2001072768A | 2001-03-21 | |||
JP2005173027A | 2005-06-30 | |||
JP2009126938A | 2009-06-11 | |||
JP2010085673A | 2010-04-15 | |||
JP2004126547A | 2004-04-22 | |||
JP2008285660A | 2008-11-27 | |||
JP2002012664A | 2002-01-15 |
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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