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Title:
PROCESSING CHAMBER WITH OPTICAL WINDOW CLEANED USING PROCESS GAS
Document Type and Number:
WIPO Patent Application WO2000059009
Kind Code:
A3
Abstract:
An apparatus is provided including a semiconductor processing chamber enclosed by a plurality of walls. Also included is a source of process gas that is required for processing a wafer within the processing chamber. Mounted on one of the walls of the processing chamber is a window. An inlet is positioned adjacent to the window and remains in communication with the processing chamber. The inlet is further coupled to the source of process gas to channel the process gas into the chamber for both preventing the deposition of byproducts on the window and further processing the wafer within the processing chamber.

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Inventors:
NI TUQUIANG
COLLISON WENLI
Application Number:
PCT/US2000/008514
Publication Date:
March 01, 2001
Filing Date:
March 30, 2000
Export Citation:
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Assignee:
LAM RES CORP (US)
International Classes:
H01L21/302; G01B11/00; G02B7/00; H01L21/00; H01L21/205; H01L21/3065; H01L21/31; (IPC1-7): H01L21/00
Foreign References:
US5229081A1993-07-20
US4582431A1986-04-15
EP0768525A21997-04-16
EP1004937A22000-05-31
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