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Title:
PRODUCTION METHOD FOR ORGANIC SEMICONDUCTOR INK COMPOSITION, ORGANIC SEMICONDUCTOR INK COMPOSITION, ORGANIC PHOTOELECTRIC CONVERSION FILM, AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT
Document Type and Number:
WIPO Patent Application WO/2024/075812
Kind Code:
A1
Abstract:
Provided is an organic semiconductor ink composition that makes it possible to reduce the foreign material in an organic photoelectric conversion film. This production method for an organic semiconductor ink composition is a production method for an organic semiconductor ink composition that contains a p-type organic semiconductor, an n-type organic semiconductor, and a non-halogen organic solvent. The production method includes: a first dissolution in which an organic semiconductor that is at least one of the p-type organic semiconductor and the n-type organic semiconductor is dissolved in the non-halogen organic solvent to obtain a partial solution; a first filtration that is a filtration of the partial solution obtained by the first dissolution; and an organic semiconductor post-addition in which an organic semiconductor that is at least one of the p-type organic semiconductor and the n-type organic semiconductor is added to the solution obtained by the first filtration to obtain a whole solution.

Inventors:
NAKABAYASHI KAZUHIRO (JP)
NAKANE SHIGERU (JP)
NAKAYAMA HIDENORI (JP)
Application Number:
PCT/JP2023/036347
Publication Date:
April 11, 2024
Filing Date:
October 05, 2023
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP (JP)
International Classes:
H10K30/60; H10K30/30; H10K71/12
Domestic Patent References:
WO2013099926A12013-07-04
WO2018131350A12018-07-19
Foreign References:
JP2021136402A2021-09-13
JP2017139437A2017-08-10
JP2014090156A2014-05-15
JP2007528122A2007-10-04
JP2022166501A2022-11-02
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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