Title:
PRODUCTION METHOD FOR ORGANIC SOLVENT
Document Type and Number:
WIPO Patent Application WO/2020/184306
Kind Code:
A1
Abstract:
Provided is a production method for an organic solvent that contains less metal impurities which cause minute defects on a wafer in a lithography step when manufacturing a semiconductor device, or a method for reducing metals in an organic solvent to be purified. This production method for an organic solvent comprises a step for passing a liquid through a filter cartridge, wherein the filter cartridge is obtained by layering, or wrapping around an hollow inner cylinder, a plurality of types of base cloths for filtration, and is characterized in that the base cloths for filtration are nonwoven fabric obtained by chemically bonding a metal adsorption group to polyolefin fibers, the base cloths for filtration include nonwoven fabric layer A and nonwoven fabric layer B, the nonwoven fabric layer A includes polyolefin fibers to which a sulfonate group is chemically bonded as a metal adsorption group, the nonwoven fabric layer B includes polyolefin fibers having chemically bonded thereto as a metal adsorption group at least one selected from the group consisting of an amino group, an N-methyl-D-glucamine group, an iminodiacetate group, an iminodiethanol group, an amidoxime group, a phosphate group, a carboxylate group, and an ethylene diamine triacetate group.
Inventors:
OHASHI TOMOYA (JP)
YOSHIDA TOYOSHIRO (JP)
SASSA SUGURU (JP)
YOSHIDA TOYOSHIRO (JP)
SASSA SUGURU (JP)
Application Number:
PCT/JP2020/008972
Publication Date:
September 17, 2020
Filing Date:
March 03, 2020
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C07C41/34; C07C43/13; C07C67/48; C07C69/16
Domestic Patent References:
| WO2018051716A1 | 2018-03-22 |
Foreign References:
| JP2018167223A | 2018-11-01 | |||
| JP2009090259A | 2009-04-30 | |||
| JP2016073922A | 2016-05-12 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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