Title:
PRODUCTION METHOD FOR PRODUCING DISILANE, TRISILANE, AND TETRASILANE GASES FROM SILANE GAS USING DIELECTRIC BARRIER DISCHARGE
Document Type and Number:
WIPO Patent Application WO/2014/200222
Kind Code:
A1
Abstract:
The present invention relates to a production method for producing disilane, trisilane, and tetrasilane gases from silane gas using a dielectric barrier discharge and, more specifically, to a production method for producing disilane, trisilane, and tetrasilane gases from silane gas using a dielectric barrier discharge, by which disilane can be produced from silane in a continuous process by using a dielectric barrier discharge reactor, and which comprises: installing an electrode rod enclosed with an insulator inside a reactor; and simultaneously introducing, in a predetermined ratio, silane gas and a mixture of hydrogen and an inert gas of helium or nitrogen, the mixture and silane gas forming a source gas, the production method enabling the use of a wide range of reaction conditions, including reaction pressure and reaction temperature, and allowing a continuous yield of 50 up to 85% depending on the reaction conditions.
Inventors:
YUICHI IIKUBO (US)
JANG HYANG-JA (KR)
JANG HYANG-JA (KR)
Application Number:
PCT/KR2014/004919
Publication Date:
December 18, 2014
Filing Date:
June 03, 2014
Export Citation:
Assignee:
YUICHI IIKUBO (US)
JANG HYANG-JA (KR)
JANG HYANG-JA (KR)
International Classes:
C01B33/021; B01J7/00; B01J19/12; C01B33/04
Foreign References:
| US5478453A | 1995-12-26 | |||
| KR101231370B1 | 2013-02-07 | |||
| US20130129582A1 | 2013-05-23 | |||
| US20060244386A1 | 2006-11-02 | |||
| US6399489B1 | 2002-06-04 |
Attorney, Agent or Firm:
JIN, YONG-SUK (KR)
진용석 (KR)
진용석 (KR)
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