Title:
PRODUCTION METHOD FOR SPIN VALVE FILM AND PRODUCTION METHOD OF MAGNETORESISTANCE EFFECT TYPE MAGNETIC HEAD
Document Type and Number:
WIPO Patent Application WO/2002/052658
Kind Code:
A1
Abstract:
A Cu film serving as the non-magnetic layer of a spin valve film is formed on a substrate in a sputter film forming chamber in which a film is formed by sputtering under a reduced pressure, a substrate is exposed to a gas atmosphere in a gas exposing chamber into which gas activating the surface of the Cu film is introduced, and the substrate is moved again to the sputter film forming chamber to form the remaining portion of the spin valve film.
Inventors:
MAKINO EIJI (JP)
Application Number:
PCT/JP2001/010403
Publication Date:
July 04, 2002
Filing Date:
November 28, 2001
Export Citation:
Assignee:
SONY CORP (JP)
MAKINO EIJI (JP)
MAKINO EIJI (JP)
International Classes:
G01R33/09; G11B5/39; H01F10/16; H01F10/32; H01F41/30; H01L43/08; H01L43/12; G11B5/31; (IPC1-7): H01L43/08; H01L43/12; G11B5/39; G01R33/09; H01F10/32
Foreign References:
| JP2001283413A | 2001-10-12 | |||
| JP2001052314A | 2001-02-23 | |||
| JPH11144956A | 1999-05-28 | |||
| JP2000058941A | 2000-02-25 |
Attorney, Agent or Firm:
Koike, Akira (6-4 Toranomon 2-chome Minato-ku, Tokyo, JP)
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