PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

WIPO Patent Application WO/2007/111104

A1

Provided is a projection optical system, which has a relatively large image side numerical aperture of, for instance, 0.45 or larger, and can inspect the plane shape error of a reflection plane with a prescribed accuracy. The projection optical system is provided with a first reflecting imaging optical system (G1) for forming an intermediate image of a first plane based on light from a first plane (4), and a second reflecting imaging optical system (G2) for forming a reduced image on a second plane (7) based on light from the intermediate image. The first reflecting imaging optical system (G1) is provided with a first concave reflection mirror (M1), a second convex reflection mirror (M2), a third reflection mirror (M3) and a fourth concave reflection mirror (M4). The second reflecting imaging optical system (G2) is provided with a fifth concave reflection mirror (M5), a sixth reflection mirror (M6), a seventh convex reflection mirror (M7) and an eighth concave reflection mirror (M8). The conditions of 1