Title:
PROXIMITY EXPOSURE APPARATUS AND PROXIMITY EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2018/105658
Kind Code:
A1
Abstract:
A proximity exposure apparatus is provided with: a plane mirror (68) having a mirror transformation unit (70) capable of correcting the curvature thereof; a CCD camera (30) capable of capturing images of a mask M-side alignment mark (Ma) and a workpiece (W)-side alignment mark (Wa); a storage unit (91) which stores an initial deviation component of the alignment mark (Wa), the initial deviation component being calculated from the angle of a principal ray (EL) with which the workpiece (W) is irradiated and a gap between the mask (M) and the workpiece (W) when a pattern of a first layer mask (M) is exposed; and a control device (90) which, when a pattern of a second or subsequent layer mask (M) is exposed, performs alignment adjustment using a workpiece (W)-side corrected alignment mark (Wa') obtained by offsetting the initial deviation component with respect to the workpiece (W)-side alignment mark (Wa) observed by the CCD camera (30), and the mask M-side alignment mark (Ma).
Inventors:
KAWASHIMA HIRONORI (JP)
Application Number:
PCT/JP2017/043825
Publication Date:
June 14, 2018
Filing Date:
December 06, 2017
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
G03F9/00; G02B5/10; G03F7/20
Domestic Patent References:
| WO2007145038A1 | 2007-12-21 |
Foreign References:
| JP2012155086A | 2012-08-16 | |||
| JP2011028122A | 2011-02-10 | |||
| JP2006293197A | 2006-10-26 | |||
| JP2003224058A | 2003-08-08 | |||
| JP2000081708A | 2000-03-21 | |||
| JPH07106230A | 1995-04-21 |
Attorney, Agent or Firm:
EIKOH PATENT FIRM, P.C. (JP)
Download PDF:
Previous Patent: SCREEN PLATE AND METHOD FOR MANUFACTURING SAME
Next Patent: PRODUCTION LINE CONTROL SYSTEM
Next Patent: PRODUCTION LINE CONTROL SYSTEM