Title:
PUMP
Document Type and Number:
WIPO Patent Application WO/2021/172967
Kind Code:
A1
Abstract:
The present invention relates to a pump. The pump, according to the present invention, comprises: a housing inwardly forming a suction chamber and a discharge chamber; a suction part extending outward from the circumferential surface of the housing and having a suction passage through which a fluid is supplied to the suction chamber; a discharge part disposed below the suction part, extending from the circumferential surface of the housing in a direction opposite to the extending direction of the suction part, and having a discharge passage through which the fluid is discharged from the discharge chamber; a partition wall partitioning the suction chamber and the discharge chamber, and having a communication hole formed in a central portion thereof so as to communicate the suction chamber and the discharge chamber; an impact body disposed toward the suction part so as to be in contact with the fluid flowing into the suction chamber from the suction passage; and a gas discharge part disposed on the circumferential surface of the housing, and communicating with the outside such that gas, separated from the fluid in contact with the impact body, is discharged, wherein the suction part extends in one direction perpendicular to a virtual center line crossing the housing, and the impact body is disposed in a direction opposite to the direction in which the suction part extends with respect to the center line.
Inventors:
SON MINSU (KR)
BAEK SEUNGJO (KR)
SONG YOUJOON (KR)
BAEK SEUNGJO (KR)
SONG YOUJOON (KR)
Application Number:
PCT/KR2021/002545
Publication Date:
September 02, 2021
Filing Date:
March 02, 2021
Export Citation:
Assignee:
LG ELECTRONICS INC (KR)
International Classes:
F04D7/04; B01D19/00; F04D29/42
Foreign References:
| KR20080045443A | 2008-05-23 | |||
| US20060064954A1 | 2006-03-30 | |||
| KR20130035238A | 2013-04-08 | |||
| US20110143311A1 | 2011-06-16 | |||
| US3930745A | 1976-01-06 |
Attorney, Agent or Firm:
PARK, Byung Chang (KR)
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