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Title:
PURIFICATION METHOD FOR COMPOUND OR RESIN
Document Type and Number:
WIPO Patent Application WO/2015/080240
Kind Code:
A1
Abstract:
The purification method according to the present invention is for either a compound expressed by formula (1) or a resin having the structure exhibited by formula (2), and contains a step in which an acidic water-soluble solution is contacted with a solution (A), which contains either the compound or the resin and an organic solvent optionally not mixed with water (in the formula, X is an oxygen atom or a sulphur atom, R1 is a single bond or a hydrocarbon group, R2 is an alkyl group or a hydroxyl group, etc., and at least one of R2 is a hydroxyl group, R3 is a single bond or an alkylene group, m is 1-6, m2 is 1-5, p is 0 or 1, and n is 1-4).

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Inventors:
ECHIGO MASATOSHI (JP)
MAKINOSHIMA TAKASHI (JP)
UCHIYAMA NAOYA (JP)
Application Number:
PCT/JP2014/081508
Publication Date:
June 04, 2015
Filing Date:
November 28, 2014
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07D311/92; C08G8/20
Domestic Patent References:
WO2013024778A12013-02-21
WO2013024779A12013-02-21
WO2013024778A12013-02-21
WO2013024779A12013-02-21
Foreign References:
JPH0519463A1993-01-29
JP2002182402A2002-06-26
JP2012224793A2012-11-15
JP2013248012A2013-12-12
Other References:
See also references of EP 3075728A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
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